Maximum product size:8-inch and below wafers
Equipment dimensions:970mm x 1450mm x 2024mm (width x depth x height)
Heating temperature range:Room temperature~~800 ℃ (thermocouple) 800 ℃~1250 ℃ (infrared pyrometer)
Product Name:Rapid Thermal Annealing System
Model:RTP-150RL
Maximum sample size:150mm
