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Product Details:
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| Appearance: | Circular Belt Positioning Edge | Product Name: | Aluminum Nitride Wafer |
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| Diameter(mm): | 25.4±0.5 | Thickness(μm): | 400±50 |
| Crystal Form: | 2H | Polytype: | {0001}±0.5° |
| Highlight: | 25.4mm AlN Single Crystal,2H aluminum nitride substrate,1inch AlN Single Crystal |
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25.4±0.5mm 1inch AlN Single Crystal 400±50μM S/P/R Grade {0001}±0.5°
JDCD02-001-002 1inch AlN single crystal 400±50μm S/P/R grade
Aluminum Nitride is a highly desirable material in specific applications where high thermal conductivity, electrical insulation, and/or mechanical strength is required.
The material is a good electrical insulator with excellent thermal conductivity. Its high insulating properties make it an excellent choice for a variety of applications. A wide variety of products can be made from aluminum nitride.
This is the most common use for aluminum nitride. It is an important material in the aerospace industry. However, there are some limitations associated with it. It is unstable at high temperatures and in some environments.
| 1inch Aluminum nitride single crystal substrate | |||
| Crystal Specifications | Parameter value | ||
| Diameter(mm) | 25.4±0.5 | ||
| Thickness(μm) | 400±50 | ||
| Crystal Form | 2H | ||
| Polytype | {0001}±0.5° | ||
| Surface polishing | Aluminum surface: chemical polishing (double polishing can be customized) | ||
| Roughness |
Al face:≤0.5nm N face(back):≤1.2μm |
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| appearance | Circular belt positioning edge | ||
| Quality grade | S grade(Super) | P grade(Prouduction) | R grade(Research) |
| HRXRD Half height width@{0002}(arcsec) | ≤150 | ≤300 | ≤500 |
| HRXRD Half height width@{10-12}(arcsec) | ≤100 | ≤200 | ≤400 |
| absorption coefficient@265nm(cm-1) | ≤50 | ≤70 | ≤100 |
| Edge Exclusion(mm) | 1 | 1 | 1 |
| Indents | / | / | / |
| Chips | / | / | ≤3 Cumulative ≤1.0mm |
| TUA | ≥90% | ||
| Main positioning edge orientation | {10-10}±5.0° | ||
| Orientation of secondary locating surface |
Al face:Rotate clockwise in the direction of the main positioning edge90°±5° N face:Rotate counterclockwise in the direction of the main positioning edge90°±5° |
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| TTV(μm) | ≤30 | ||
| Warp(μm) | ≤30 | ||
| Bow(μm) | ≤30 | ||
| Cracks | No, naked eye, strong light | ||
| Contamination | No, naked eye, radiation | ||
| Laser coding | N face,Parallel to the main locating edge | ||
| Package | Monolithic wafer box | ||
About Us
We specialize in processing a variety of materials into wafers, substrates and customized optical glass parts.components widely used in electronics, optics, opto electronics and many other fields. We also have been working closely with many domestic and oversea universities, research institutions and companies, provide customized products and services for their R&D projects. It's our vision to maintaining a good relationship of cooperation with our all customers by our good reputations.
FAQ
Q: Are you trading company or manufacturer ?
We are factory.
Q: How long is your delivery time?
Generally it is 3-5 days if the goods are in stock.
or it is 7-10 days if the goods are not in stock, it is according to quantity.
Q: Do you provide samples ? is it free or extra ?
Yes, we could offer the sample for free charge but do not pay the cost of freight.
Q: What is your terms of payment ?
Payment <=5000USD, 100% in advance.
Paymen >=5000USD, 80% T/T in advance , balance before shippment.
Contact Person: Xiwen Bai (Ciel)
Tel: +8613372109561
