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1inch Aluminum Nitride AlN Single Crystal Sapphire Wafer 400um

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1inch Aluminum Nitride AlN Single Crystal Sapphire Wafer 400um

1inch Aluminum Nitride AlN Single Crystal Sapphire Wafer 400um
1inch Aluminum Nitride AlN Single Crystal Sapphire Wafer 400um

Large Image :  1inch Aluminum Nitride AlN Single Crystal Sapphire Wafer 400um

Product Details:
Place of Origin: Suzhou China
Brand Name: GaNova
Certification: UKAS/ISO9001:2015
Model Number: JDCD02-001-003
Payment & Shipping Terms:
Packaging Details: Vacuum packing in a class 10000 clean room environment,in cassettes of 25pcs or single wafer containers.
Payment Terms: T/T

1inch Aluminum Nitride AlN Single Crystal Sapphire Wafer 400um

Description
Product Name: AlN Single Crystal Roughness: Al Face:≤0.5nm N Face(back):≤1.2μm
Appearance: Circular Belt Positioning Edge TUA: ≥90%
Main Positioning Edge Orientation: {10-10}±5.0° TTV(μm): ≤30
Highlight:

1inch single crystal sapphire wafer

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polished sapphire wafers 400um

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AlN single crystal sapphire wafer

JDCD02-001-003 1inch AlN single crystal 400±50μm S/P/R grade

 

What is Aluminum Nitride? Aluminum Nitride (AlN) is an excellent material to use if high thermal conductivity and electrical insulation properties are required; making it an ideal material for use in thermal management and electrical applications.

 

 

1inch Aluminum nitride single crystal substrate
Crystal Specifications Parameter value
Diameter(mm) 25.4±0.5
Thickness(μm) 400±50
Crystal Form 2H
Polytype {0001}±0.5°
Surface polishing Aluminum surface: chemical polishing (double polishing can be customized)
Roughness

Al face:≤0.5nm

N face(back):≤1.2μm

appearance Circular belt positioning edge
Quality grade S grade(Super) P grade(Prouduction) R grade(Research)
HRXRD Half height width@{0002}(arcsec) ≤150 ≤300 ≤500
HRXRD Half height width@{10-12}(arcsec) ≤100 ≤200 ≤400
absorption coefficient@265nm(cm-1) ≤50 ≤70 ≤100
Edge Exclusion(mm) 1 1 1
Indents / / /
Chips / / ≤3 Cumulative ≤1.0mm
TUA ≥90%
Main positioning edge orientation {10-10}±5.0°
Orientation of secondary locating surface

Al face:Rotate clockwise in the direction of the main positioning edge90°±5°

N face:Rotate counterclockwise in the direction of the main positioning edge90°±5°

TTV(μm) ≤30
Warp(μm) ≤30
Bow(μm) ≤30
Cracks No, naked eye, strong light
Contamination No, naked eye, radiation
Laser coding N face,Parallel to the main locating edge
Package Monolithic wafer box

 

 

 

About Us

We specialize in processing a variety of materials into wafers, substrates and customized optical glass parts.components widely used in electronics, optics, opto electronics and many other fields. We also have been working closely with many domestic and oversea universities, research institutions and companies, provide customized products and services for their R&D projects. It's our vision to maintaining a good relationship of cooperation with our all customers by our good reputations.

 

 

FAQ

Q: Are you trading company or manufacturer ?
We are factory.
Q: How long is your delivery time?
Generally it is 3-5 days if the goods are in stock.
or it is 7-10 days if the goods are not in stock, it is according to quantity.
Q: Do you provide samples ? is it free or extra ?
Yes, we could offer the sample for free charge but do not pay the cost of freight.
Q: What is your terms of payment ?
Payment <=5000USD, 100% in advance.
Paymen >=5000USD, 80% T/T in advance , balance before shippment.

 

Contact Details
Shanghai GaNova Electronic Information Co., Ltd.

Contact Person: Xiwen Bai (Ciel)

Tel: +8613372109561

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